|
Suitability
|
for vacuum deposition, useful for making
semiconductor devices, gallium-alumina catalyst, gas sensors, luminescent
phosphors and dielectric coatings of solar cells, used as an evaporated
material and sputtering target of 99.999% in dielectric films, it shows
potential for developing deep-ultraviolet TCOs (transparent conductive oxides)
and transparent electrodes for ultraviolet optoelectronic devices, recent
studies shows that can be a strong contender for power electronic devices for
example in ultrahigh-voltage power switching applications, films have gained
commercial interest owing to their gas sensitive characteristics, and glasses
made with Ga2O3 are the preferred optical materials for use in advanced
technologies.
|
